Growth and characterization of ZnO nanorods using chemical bath deposition
- Authors: Urgessa, Zelalem Nigussa
- Date: 2012
- Subjects: Zinc oxide , Photoluminescence , Semiconductor nanocrystals , Semiconductors -- Materials , Chemical reactions
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10559 , http://hdl.handle.net/10948/d1021124 , http://hdl.handle.net/10948/d1021119
- Description: Semiconductor devices are commonplace in every household. One application of semiconductors in particular, namely solid state lighting technology, is destined for a bright future. To this end, ZnO nanostructures have gained substantial interest in the research community, in part because of its requisite large direct band gap. Furthermore, the stability of the exciton (binding energy 60 meV) in this material, can lead to lasing action based on exciton recombination and possibly exciton interaction, even above room temperature. Therefore, it is very important to realize controllable growth of ZnO nanostructures and investigate their properties. The main motivation for this thesis is not only to successfully realize the controllable growth of ZnO nanorods, but also to investigate the structure, optical and electrical properties in detail by means of scanning electron microscopy (SEM), transmission electron microscopy (TEM), photoluminescence (PL) spectroscopy (steady state and time resolved) and X-ray diffraction (XRD). Furthermore, strong rectification in the ZnO/p-Si heterojunction is demonstrated. Nanorods have been successfully synthesized on silicon by a two-step process, involving the pre-coating of the substrate by a seed layer, followed by the chemical bath deposition of the nanorods. ZnO seed layers with particle sizes of about 5 nm are achieved by the thermal decomposition of zinc acetate dihydrate dissolved in ethanol. The effects of the seed layer density on the distribution, alignment and uniformity of subsequently grown nanorods were studied. The aspect ratio, orientation and distribution of nanorods are shown to be well controlled through adjusting the density of the ZnO nanoparticles pre-coated onto the substrates. It is shown that the seed layer is a prerequisite for the growth of well aligned ZnO nanorods on lattice mismatched Si substrate. The influence of various nanorod growth parameters on the morphology, optical and electrical properties of the nanorods were also systematically studied. These include the oxygen to zinc molar ratio, the pH of the growth solution, the concentration of the reactants, the growth temperature and growth time, different hydroxide precursors and the addition of surface passivating agents to the growth solution. By controlling these xii parameters different architectures of nanostructures, like spherical particles, well aligned nanorods, nanoflowers and thin films of different thicknesses are demonstrated. A possible growth mechanism for ZnO nanostructures in solution is proposed. XRD indicated that all the as-grown nanostructures produced above 45 C crystallize in the wurtzite structure and post growth annealing does not significantly enhance the crystalline quality of the material. In material grown at lower temperature, traces of zinc hydroxide were observed. The optical quality of the nanostructures was investigated using both steady-state PL and time-resolved (TR) PL from 4 K to room temperature. In the case of as-grown samples, both UV and defect related emissions have been observed for all nanostructures. The effect of post-growth annealing on the optical quality of the nanostructures was carefully examined. The effect of annealing in different atmospheres was also investigated. Regardless of the annealing environment annealing at a temperature as low as 300 C enhances the UV emission and suppresses defect related deep level emission. However, annealing above 500 C is required to out-diffuse hydrogen, the presence of which is deduced from the I4 line in the low temperature PL spectra of ZnO. TRPL was utilized to investigate lifetime decay profiles of nanorods upon different post growth treatments. The bound exciton lifetime strongly depends on the post-growth annealing temperature: the PL decay time is much faster for as grown rods, confirming the domination of surface assisted recombination. In general, the PL analysis showed that the PL of nanorods have the same characteristics as that of bulk ZnO, except for the stronger contribution from surface related bound excitons in the former case. Surface adsorbed impurities causing depletion and band bending in the near surface region is implied from both time resolved and steady state PL. Finally, although strong rectification in the ZnO/p-Si heterojunction is illustrated, no electroluminescence has been achieved. This is explained in terms of the band offset between ZnO and Si and interfacial states. Different schemes are proposed to improve the performance of ZnO/Si heterojunction light emitting devices.
- Full Text:
- Date Issued: 2012
- Authors: Urgessa, Zelalem Nigussa
- Date: 2012
- Subjects: Zinc oxide , Photoluminescence , Semiconductor nanocrystals , Semiconductors -- Materials , Chemical reactions
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10559 , http://hdl.handle.net/10948/d1021124 , http://hdl.handle.net/10948/d1021119
- Description: Semiconductor devices are commonplace in every household. One application of semiconductors in particular, namely solid state lighting technology, is destined for a bright future. To this end, ZnO nanostructures have gained substantial interest in the research community, in part because of its requisite large direct band gap. Furthermore, the stability of the exciton (binding energy 60 meV) in this material, can lead to lasing action based on exciton recombination and possibly exciton interaction, even above room temperature. Therefore, it is very important to realize controllable growth of ZnO nanostructures and investigate their properties. The main motivation for this thesis is not only to successfully realize the controllable growth of ZnO nanorods, but also to investigate the structure, optical and electrical properties in detail by means of scanning electron microscopy (SEM), transmission electron microscopy (TEM), photoluminescence (PL) spectroscopy (steady state and time resolved) and X-ray diffraction (XRD). Furthermore, strong rectification in the ZnO/p-Si heterojunction is demonstrated. Nanorods have been successfully synthesized on silicon by a two-step process, involving the pre-coating of the substrate by a seed layer, followed by the chemical bath deposition of the nanorods. ZnO seed layers with particle sizes of about 5 nm are achieved by the thermal decomposition of zinc acetate dihydrate dissolved in ethanol. The effects of the seed layer density on the distribution, alignment and uniformity of subsequently grown nanorods were studied. The aspect ratio, orientation and distribution of nanorods are shown to be well controlled through adjusting the density of the ZnO nanoparticles pre-coated onto the substrates. It is shown that the seed layer is a prerequisite for the growth of well aligned ZnO nanorods on lattice mismatched Si substrate. The influence of various nanorod growth parameters on the morphology, optical and electrical properties of the nanorods were also systematically studied. These include the oxygen to zinc molar ratio, the pH of the growth solution, the concentration of the reactants, the growth temperature and growth time, different hydroxide precursors and the addition of surface passivating agents to the growth solution. By controlling these xii parameters different architectures of nanostructures, like spherical particles, well aligned nanorods, nanoflowers and thin films of different thicknesses are demonstrated. A possible growth mechanism for ZnO nanostructures in solution is proposed. XRD indicated that all the as-grown nanostructures produced above 45 C crystallize in the wurtzite structure and post growth annealing does not significantly enhance the crystalline quality of the material. In material grown at lower temperature, traces of zinc hydroxide were observed. The optical quality of the nanostructures was investigated using both steady-state PL and time-resolved (TR) PL from 4 K to room temperature. In the case of as-grown samples, both UV and defect related emissions have been observed for all nanostructures. The effect of post-growth annealing on the optical quality of the nanostructures was carefully examined. The effect of annealing in different atmospheres was also investigated. Regardless of the annealing environment annealing at a temperature as low as 300 C enhances the UV emission and suppresses defect related deep level emission. However, annealing above 500 C is required to out-diffuse hydrogen, the presence of which is deduced from the I4 line in the low temperature PL spectra of ZnO. TRPL was utilized to investigate lifetime decay profiles of nanorods upon different post growth treatments. The bound exciton lifetime strongly depends on the post-growth annealing temperature: the PL decay time is much faster for as grown rods, confirming the domination of surface assisted recombination. In general, the PL analysis showed that the PL of nanorods have the same characteristics as that of bulk ZnO, except for the stronger contribution from surface related bound excitons in the former case. Surface adsorbed impurities causing depletion and band bending in the near surface region is implied from both time resolved and steady state PL. Finally, although strong rectification in the ZnO/p-Si heterojunction is illustrated, no electroluminescence has been achieved. This is explained in terms of the band offset between ZnO and Si and interfacial states. Different schemes are proposed to improve the performance of ZnO/Si heterojunction light emitting devices.
- Full Text:
- Date Issued: 2012
Development of MgZnO-grown MOCVD for UV Photonic applications
- Authors: Talla, Kharouna
- Date: 2011
- Subjects: Photoluminescence , Photonics , Zinc oxide
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10537 , http://hdl.handle.net/10948/d1012585 , Photoluminescence , Photonics , Zinc oxide
- Description: MgxZn1-xO has emerged as a material of great technological importance. Having a direct energy band gap that is tunable throughout much of the ultraviolet (UV) region of the spectrum from the near-UV (~370 nm) to the deep-UV (~176 nm), this compound is of interest for a variety of optoelectronic devices operating in this part of the electromagnetic spectrum. MgxZn1-xO offers advantages over the more mature compound semiconductor AlGaN which stem mainly from the unusually high exciton binding energy (60 meV in ZnO). In this study the growth of ZnO and MgxZn1-xO thin films using metal organic chemical vapour deposition (MOCVD) is systematically investigated. The films are mainly grown on c-Al2O3 and Si (100) and characterized using various techniques, such as photoluminescence (PL), x-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and auger electron spectroscopy (AES). The optical and the structural properties are essentially inspected in order to improve their quality. In this thesis the optimisation of ZnO grown using oxygen gas as a new oxidant in our reactor is investigated. The growth temperature and VI/II ratio are varied in order to find optimum parameters giving high quality layers. The effects of Si (100), Si (111), c- and r-sapphire, glass, GaAs and ZnO substrates on the optical, structural and morphological properties of ZnO thin films grown with tert-butanol (TBOH) is examined. Similar morphologies are observed for all substrates, with the films comprising hexagonal columns having cone shaped ends. The photoluminescence spectra are similar, but the various transitions have different relative intensities. It is clear that the different substrates influence neither the orientation of the films, nor the surface morphology, significantly. The photoluminescence hints at larger stacking fault densities in films grown on silicon and glass, however, as evidenced by stronger basal plane stacking fault-related luminescence at ~3.319 eV in the relevant low temperature photoluminescence spectra. The morphology changes with Mg incorporation, from hexagonal columnar structures to cubic faceted columns. From PL, the full with at half maximum is found to gradually increase with Mg content due to alloy broadening. The deep level emission (DLE) is observed to shift with Mg content. By changing the Mg content, the band gap of MgxZn1-xO film is tuned by ~450 meV, which provides an excellent opportunity for band gap engineering for optoelectronic applications. The c-lattice constant of ZnO (5.205 Å) decreases by only 0.6% when the Mg content reaches x=0.39. The introduction of Mg into ZnO is shown to increase the relative PL intensity of stacking fault-related transitions (at 3.314 eV for ZnO). This becomes the dominant near band edge emission. Using TEM a thin Mg rich layer is observed at the interface between the film and the Si or Al2O3. Temperature dependent PL measurements on layers with low Mg concentration (x=0.05 and 0.1) show that the main bound exciton peak exhibits an “s-shaped” temperature dependence, characteristic of localization in a disordered alloy. The origin of the PL line broadening of MgxZn1-xO (x≤0.04) is also analyzed with respect to alloy broadening, taking into account a random cation distribution and alloy clustering. The influence of various MOCVD growth parameters such as growth temperature and VI/II ratio is studied. Varying the temperature from 280 ˚C to 580 ˚C reveals strong morphological changes and optical degradation of the films. Low (<280 ˚C) and high (>580 ˚C) growth temperatures reduce the Mg incorporation. High VI/II ratios also decrease the Mg incorporation, as evidenced by the red-shift of the donor bound exciton (D°X) line. This is ascribed to a stronger premature reaction between (MeCp)2Mg and the oxidant or a preferential heterogeneous interaction between the Mg and oxygen species on the growth front. For both oxidizing agents (O2 and TBOH), the growth at 420 ˚C and a VI-II ratio of 60 on c-Al2O3 gave optimal quality layers in terms of their optical and structural quality. A comparison of films grown using TBOH and O2 gas as oxidizing agent shows no major difference in terms of Mg incorporation. The effect of annealing, the inclusion of a buffer layer and the influence of growth rate on the properties MgxZn1-xO thin films are also reported.
- Full Text:
- Date Issued: 2011
- Authors: Talla, Kharouna
- Date: 2011
- Subjects: Photoluminescence , Photonics , Zinc oxide
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10537 , http://hdl.handle.net/10948/d1012585 , Photoluminescence , Photonics , Zinc oxide
- Description: MgxZn1-xO has emerged as a material of great technological importance. Having a direct energy band gap that is tunable throughout much of the ultraviolet (UV) region of the spectrum from the near-UV (~370 nm) to the deep-UV (~176 nm), this compound is of interest for a variety of optoelectronic devices operating in this part of the electromagnetic spectrum. MgxZn1-xO offers advantages over the more mature compound semiconductor AlGaN which stem mainly from the unusually high exciton binding energy (60 meV in ZnO). In this study the growth of ZnO and MgxZn1-xO thin films using metal organic chemical vapour deposition (MOCVD) is systematically investigated. The films are mainly grown on c-Al2O3 and Si (100) and characterized using various techniques, such as photoluminescence (PL), x-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and auger electron spectroscopy (AES). The optical and the structural properties are essentially inspected in order to improve their quality. In this thesis the optimisation of ZnO grown using oxygen gas as a new oxidant in our reactor is investigated. The growth temperature and VI/II ratio are varied in order to find optimum parameters giving high quality layers. The effects of Si (100), Si (111), c- and r-sapphire, glass, GaAs and ZnO substrates on the optical, structural and morphological properties of ZnO thin films grown with tert-butanol (TBOH) is examined. Similar morphologies are observed for all substrates, with the films comprising hexagonal columns having cone shaped ends. The photoluminescence spectra are similar, but the various transitions have different relative intensities. It is clear that the different substrates influence neither the orientation of the films, nor the surface morphology, significantly. The photoluminescence hints at larger stacking fault densities in films grown on silicon and glass, however, as evidenced by stronger basal plane stacking fault-related luminescence at ~3.319 eV in the relevant low temperature photoluminescence spectra. The morphology changes with Mg incorporation, from hexagonal columnar structures to cubic faceted columns. From PL, the full with at half maximum is found to gradually increase with Mg content due to alloy broadening. The deep level emission (DLE) is observed to shift with Mg content. By changing the Mg content, the band gap of MgxZn1-xO film is tuned by ~450 meV, which provides an excellent opportunity for band gap engineering for optoelectronic applications. The c-lattice constant of ZnO (5.205 Å) decreases by only 0.6% when the Mg content reaches x=0.39. The introduction of Mg into ZnO is shown to increase the relative PL intensity of stacking fault-related transitions (at 3.314 eV for ZnO). This becomes the dominant near band edge emission. Using TEM a thin Mg rich layer is observed at the interface between the film and the Si or Al2O3. Temperature dependent PL measurements on layers with low Mg concentration (x=0.05 and 0.1) show that the main bound exciton peak exhibits an “s-shaped” temperature dependence, characteristic of localization in a disordered alloy. The origin of the PL line broadening of MgxZn1-xO (x≤0.04) is also analyzed with respect to alloy broadening, taking into account a random cation distribution and alloy clustering. The influence of various MOCVD growth parameters such as growth temperature and VI/II ratio is studied. Varying the temperature from 280 ˚C to 580 ˚C reveals strong morphological changes and optical degradation of the films. Low (<280 ˚C) and high (>580 ˚C) growth temperatures reduce the Mg incorporation. High VI/II ratios also decrease the Mg incorporation, as evidenced by the red-shift of the donor bound exciton (D°X) line. This is ascribed to a stronger premature reaction between (MeCp)2Mg and the oxidant or a preferential heterogeneous interaction between the Mg and oxygen species on the growth front. For both oxidizing agents (O2 and TBOH), the growth at 420 ˚C and a VI-II ratio of 60 on c-Al2O3 gave optimal quality layers in terms of their optical and structural quality. A comparison of films grown using TBOH and O2 gas as oxidizing agent shows no major difference in terms of Mg incorporation. The effect of annealing, the inclusion of a buffer layer and the influence of growth rate on the properties MgxZn1-xO thin films are also reported.
- Full Text:
- Date Issued: 2011
Photoluminescence study of ZnO doped with nitrogen and arsenic
- Authors: Dangbegnon, Julien Kouadio
- Date: 2010
- Subjects: Photoluminescence , Zinc oxide , Nitrogen , Arsenic
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10518 , http://hdl.handle.net/10948/1216 , Photoluminescence , Zinc oxide , Nitrogen , Arsenic
- Description: In this work, the optical properties of ZnO doped with arsenic and nitrogen were studied. The ZnO samples were grown by Metalorganic Chemical Vapor Deposition (MOCVD). The solubility of nitrogen in the ZnO films, as well as its activation upon annealing, was also investigated. Hydrogen is known as a major source for passivation of the acceptors in ZnO:N. Therefore, it is crucial to dissociate the complex(es) formed by nitrogen and hydrogen and diffuse out the hydrogen in order to prevent the reformation of such complexes. High temperatures (≥ 600 C) are required for these purposes. In order to effectively remove the hydrogen impurities from the sample, it is important to know the optical fingerprints of hydrogen and its thermal stability. Therefore, the effects of annealing and hydrogen plasma treatment on bulk ZnO (hydrothermally grown) were first studied. The use of bulk material for this purpose was motivated by the well-resolved photoluminescence (PL) lines observed for bulk ZnO, which allow the identification of the different lines related to hydrogen after plasma treatment. Annealing at 850 C was effective for the removal of most of the hydrogen related transitions in the near-band-edge emission. Also, additional transitions at ~3.364 eV and ~3.361 eV were observed after hydrogen plasma treatment, which were ascribed to hydrogen-Zn vacancy complexes. In this work, a comparative study of the annealing ambient and temperature on ZnO films grown on GaAs substrate, using diethyl zinc (DEZn) and tertiary butanol (TBOH), showed that arsenic diffuses in the ZnO films and gives a shallow level in the band gap, which is involved in an acceptor-bound exciton line at 3.35 eV. This shallow level is visible when annealing is performed in oxygen, but not when annealing is performed in nitrogen, and indeed only for annealing temperatures around 550 C. However, annealing in either ambient also causes zinc to diffuse from the ZnO films into the GaAs substrate, rendering the electrical properties deduced from Hall measurements ambiguous. For ZnO:N, NO was used as both oxygen and nitrogen sources. Monitoring the concentration of nitrogen, carbon and hydrogen in the ZnO films, the formation of different complexes from these impurities were deduced. Furthermore, an investigation of the effect of annealing on the concentrations of impurities showed that their out- diffusion was strongly dependent on the crystalline quality of the ZnO films. For porous ZnO films, obtained at low growth temperatures (≤310 C), the out-diffusion of impurities was efficient, whereas for films grown at higher temperatures, which have improved crystalline quality, the out-diffusion was practically nonexistent. The out-diffusion of unwanted impurities may activate the nitrogen dopant in the ZnO films, as was confirmed by the PL measurements on the different samples grown at different temperatures. PL transitions at ~3.24 eV and ~3.17 eV were related to substitutional NO. These transitions were more dominant in the spectra of samples grown at low temperatures. An additional transition at ~3.1 eV was assigned to a donor-acceptor pair transition involving VZn, instead of NO, as previously reported.
- Full Text:
- Date Issued: 2010
- Authors: Dangbegnon, Julien Kouadio
- Date: 2010
- Subjects: Photoluminescence , Zinc oxide , Nitrogen , Arsenic
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10518 , http://hdl.handle.net/10948/1216 , Photoluminescence , Zinc oxide , Nitrogen , Arsenic
- Description: In this work, the optical properties of ZnO doped with arsenic and nitrogen were studied. The ZnO samples were grown by Metalorganic Chemical Vapor Deposition (MOCVD). The solubility of nitrogen in the ZnO films, as well as its activation upon annealing, was also investigated. Hydrogen is known as a major source for passivation of the acceptors in ZnO:N. Therefore, it is crucial to dissociate the complex(es) formed by nitrogen and hydrogen and diffuse out the hydrogen in order to prevent the reformation of such complexes. High temperatures (≥ 600 C) are required for these purposes. In order to effectively remove the hydrogen impurities from the sample, it is important to know the optical fingerprints of hydrogen and its thermal stability. Therefore, the effects of annealing and hydrogen plasma treatment on bulk ZnO (hydrothermally grown) were first studied. The use of bulk material for this purpose was motivated by the well-resolved photoluminescence (PL) lines observed for bulk ZnO, which allow the identification of the different lines related to hydrogen after plasma treatment. Annealing at 850 C was effective for the removal of most of the hydrogen related transitions in the near-band-edge emission. Also, additional transitions at ~3.364 eV and ~3.361 eV were observed after hydrogen plasma treatment, which were ascribed to hydrogen-Zn vacancy complexes. In this work, a comparative study of the annealing ambient and temperature on ZnO films grown on GaAs substrate, using diethyl zinc (DEZn) and tertiary butanol (TBOH), showed that arsenic diffuses in the ZnO films and gives a shallow level in the band gap, which is involved in an acceptor-bound exciton line at 3.35 eV. This shallow level is visible when annealing is performed in oxygen, but not when annealing is performed in nitrogen, and indeed only for annealing temperatures around 550 C. However, annealing in either ambient also causes zinc to diffuse from the ZnO films into the GaAs substrate, rendering the electrical properties deduced from Hall measurements ambiguous. For ZnO:N, NO was used as both oxygen and nitrogen sources. Monitoring the concentration of nitrogen, carbon and hydrogen in the ZnO films, the formation of different complexes from these impurities were deduced. Furthermore, an investigation of the effect of annealing on the concentrations of impurities showed that their out- diffusion was strongly dependent on the crystalline quality of the ZnO films. For porous ZnO films, obtained at low growth temperatures (≤310 C), the out-diffusion of impurities was efficient, whereas for films grown at higher temperatures, which have improved crystalline quality, the out-diffusion was practically nonexistent. The out-diffusion of unwanted impurities may activate the nitrogen dopant in the ZnO films, as was confirmed by the PL measurements on the different samples grown at different temperatures. PL transitions at ~3.24 eV and ~3.17 eV were related to substitutional NO. These transitions were more dominant in the spectra of samples grown at low temperatures. An additional transition at ~3.1 eV was assigned to a donor-acceptor pair transition involving VZn, instead of NO, as previously reported.
- Full Text:
- Date Issued: 2010
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